AI SearchAdvances in CMP/polishing technologies for the manufacture of electronic devices / (Record no. 2233)
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| 000 -LEADER | |
|---|---|
| fixed length control field | 01174cam a2200277Ma 4500 |
| 005 - DATE AND TIME OF LATEST TRANSACTION | |
| control field | 20260817161655.0 |
| 008 - FIXED-LENGTH DATA ELEMENTS--GENERAL INFORMATION | |
| fixed length control field | 111221s2012 enkacd ob 001 0 eng d |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 9781437778601 |
| 020 ## - INTERNATIONAL STANDARD BOOK NUMBER | |
| International Standard Book Number | 1437778607 |
| 035 ## - SYSTEM CONTROL NUMBER | |
| System control number | .b12251422 |
| 245 00 - TITLE STATEMENT | |
| Title | Advances in CMP/polishing technologies for the manufacture of electronic devices / |
| Statement of responsibility, etc. | edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa |
| 250 ## - EDITION STATEMENT | |
| Edition statement | 1st ed. |
| 260 ## - PUBLICATION, DISTRIBUTION, ETC. | |
| Place of publication, distribution, etc. | Oxford : |
| Name of publisher, distributor, etc. | Elsevier, |
| Date of publication, distribution, etc. | 2012. |
| 300 ## - PHYSICAL DESCRIPTION | |
| Extent | 1 online resource (xii, 317 pages) : |
| Other physical details | illustrations, color portraits |
| 504 ## - BIBLIOGRAPHY, ETC. NOTE | |
| Bibliography, etc. note | Includes bibliographical references and index |
| 520 3# - SUMMARY, ETC. | |
| Summary, etc. | CMP and polishing are the most precise processes used to finish the surfaces of mechanical and electronic or semiconductor components. --P. 4 of cover |
| 650 #0 - SUBJECT ADDED ENTRY--TOPICAL TERM | |
| Topical term or geographic name entry element | Grinding and polishing |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Doi, Toshiro K., |
| Dates associated with a name | 1947- |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Marinescu, Ioan D. |
| 700 1# - ADDED ENTRY--PERSONAL NAME | |
| Personal name | Kurokawa, Syuhei |
| 856 40 - ELECTRONIC LOCATION AND ACCESS | |
| Materials specified | Download: Knovel |
| Uniform Resource Identifier | <a href="https://app.knovel.com/hotlink/toc/id:kpACMPPTM3/advances-in-cmp-polishing/advances-in-cmp-polishing">https://app.knovel.com/hotlink/toc/id:kpACMPPTM3/advances-in-cmp-polishing/advances-in-cmp-polishing</a> |
| 907 ## - LOCAL DATA ELEMENT G, LDG (RLIN) | |
| a | .b12251422 |
| b | mngc |
| c | n |
| 902 ## - LOCAL DATA ELEMENT B, LDB (RLIN) | |
| a | 251209 |
| 998 ## - LOCAL CONTROL INFORMATION (RLIN) | |
| Operator's initials, OID (RLIN) | 0 |
| Cataloger's initials, CIN (RLIN) | 190207 |
| First date, FD (RLIN) | e |
| -- | h |
| -- | n |
| -- | 0 |
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